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Semiconductor |
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Multi purpose 1:1 direct sputtering system with multi target which is 7 inch or 10 inch cathode in one chamber. |
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High Dep rate INLINE SPUTTER |
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- Vertical type INLINE Sputter
- Rotary Cathode
- SiO2 Dep rate > 5nm/min
- Uniformity < ¡¾5%
- Arcing Free Control
- Plasma Damage Free Process |
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