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    History
200412   Established Sorona Inc.
200502   Cluster sputtering system supplying for metal and oxide film
03   Dry etching system supplying for metal film
03   Patent resistration "0477546"
04   HDP-CVD system supply
06   Patent resistration "0495872"
07   Approved R&D center by KOTIA
08   Approved ISO9001:2000
08   Approved Venture company by KIBO
11   Approved CE Marking for sputtering system
200604   Joined in "Medium and small sized enterprise technical innovation
      & development business" which Ministry of Science & Technology
      Executes
06   Development of SAM coating system for imprinting & bio-technology
09   Patent resistration "10-0628557"
200906   Patent resistration "10-0904719"
201009   SAM coating system exports to the Singapore
11   Patent resistration "10-0994920"
201106   Development of ICP etching system of sapphire etching for LED
201202   Patent resistration "10-1124167"
08   Patent resistration "10-1176616"
10   Sputtering system exports to the China
12   Patent Registration "10-120989"
201302   Patent Registration "10-1235906"
03   Development of SiGe epitaxial growing system by sputtering
04   Epi growing system exports to the US
201404   Development of Microwave ashing system
201501   Development of AlN Reactive sputtering system
07   Development of Large area LED Etching system"SIE-1204" and
      supply
11   Patent Registration "10-1574785"
201709   LED Etching system"SIE-1204" supply
201802   High step coverage "HSC" sputter system supply
03   IN-LINE sputter system supply
201907   Moved to the anew founded factory

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