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Coating service
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Coating service
We are providing optimized deposition of sputtering and process development service with accumulated technologies to customers having various requirements. Our coating service teams are doing our utmost so as to meet of your requirements.

  Available to deposition of all metal 
      (Al, Cu, Ti, TiW, Cr, Ni, Mo, MoW, SiGe etc…)

  Available to deposition of all non-metal
      (Si3N4, SiO2, ITO, CrOx, etc…) 

  Available to loading of various sample size 

  Max. Substrate size : 370(H)x470(W)

  Ultimate pressure : 5.0x10E-8 Torr

   Rectangular source quantity : 6 set 

  Available in-situ RF plasma cleaning

  Film uniformity : <±5% within 370x470 Glass

  DC Generator : 10Kw

  RF Generator : 3Kw, 13.56MHz for sputtering

  RF Generator : 3Kw, 2.0MHz for sputtering

  RF Generator : 600W, 13.56 MHz for Plasma Treatment

  MF Generator : 10Kw, 40KHz

  Pulsed DC Generator : 15Kw

  Process development service for optimized customizing

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경기도 평택시 고덕면 서동대로 2726번지(동고리 248-8) / TEL : +82-31-667-9954
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