Multi purpose single load-lock sputtering system with multi target which is 4inch or 7inch cathode in one chamber.

Simultaneously depositing numerous materials is an important adjunct to thin film materials research and production. Clusters of three, four, or more SORONA sputter sources (cathodes) mounted on a single flange which converge at some distance from the target surfaces are ideal for these applications.

Each individual sputter source retains its specification when mounted in a cluster arrangement. Our more sophisticated SORONA cluster sources have cross contamination shields, internal target gas injection ports, and individual source shutters.  

For applications requiring simultaneous depositions on large substrates, provisions should be made to the deposition system for substrate rotation to ensure uniform film thickness and composition.

FEATURE

• Off axis type sputtering
• Highly reliable substrate transfer mechanism
• Compact system with loadlock
• Auto/Semi/Manual control
• Available Multi-layer processing
• Real time system monitoring
• Safety Interlock monitoring
• Easy maintenance
• Exceptional film quality
• Available Reactive sputtering