Multi purpose 1:1 direct sputtering system with multi target which is 7 inch or 10 inch cathode in one chamber.
SORONA Inc. has delivered numerous multi-chamber “HYBRID” physical vapor deposition (PVD) systems. This dual chamber high vacuum system contains 10” sputter sources with electrostatic chuck and pre-cleaning function. Each station is fitted with an rotating substrate heater. A single load-lock introduces the substrate and vacuum robot arms transfer it between chambers.
Face to face sputtering
Highly reliable substrate transfer mechanism
Available Multi-layer processing
Real time system monitoring
Safety Interlock monitoring
Exceptional film quality
Available Reactive sputtering
Via <Φ1um pattern step coverage results
- Aspect ratio : 7.5:1
- Top Thick : 197nm
- Bottom Thick : 67nm
- Bottom coverage : 34%