Multi purpose 1:1 direct sputtering system with multi target which is 7 inch or 10 inch cathode in one chamber.

SORONA Inc. has delivered numerous multi-chamber “HYBRID” physical vapor deposition (PVD) systems. This dual chamber high vacuum system contains 10” sputter sources with electrostatic chuck and pre-cleaning function. Each station is fitted with an rotating substrate heater. A single load-lock introduces the substrate and vacuum robot arms transfer it between chambers.

Feature

Face to face sputtering
Highly reliable substrate transfer mechanism
Auto/Semi/Manual control
Available Multi-layer processing
Real time system monitoring
Safety Interlock monitoring
Easy maintenance
Exceptional film quality
Available Reactive sputtering

Via <Φ1um pattern step coverage results

 Conditions
   - Aspect ratio       : 7.5:1
   - Top Thick          : 197nm
   - Bottom Thick      : 67nm
   - Bottom coverage : 34%